Iwaki FW and FW-H Series Pneumatic Bellows Pumps

Iwaki FW/FW-H is a series of pneumatic (air-driven) bellows pumps whose main feature is a thick-walled bellows. The wetted parts are fluororesin (PTFE/PFA), as on the FS and FA series of the same F series catalog (F_W0051-13). The thick bellows raises the discharge pressure rating to as high as 0.45 MPa.

Thick bellows design

According to the manufacturer, the thick bellows allows the pump to work at discharge pressures of up to 0.45 MPa and gives the bellows a service life three to four times longer than a diaphragm, which means substantially reduced downtime. The suction and discharge tubes are made of PFA and formed internally, which prevents the accumulation of particles. The proximity switch drive system, with sensors built into the pump, opens and closes an external air solenoid valve. When connected to a special controller, the discharge can be monitored and controlled easily.

Model	Max. discharge capacity	Max. stroke speed	Liquid temperature	Air supply pressure
FW-20	20 L/min (1200 L/h)	120 spm	10-100 °C	0.2-0.5 MPa
FW-40	40 L/min (2400 L/h)	80 spm	10-100 °C	0.2-0.5 MPa
FW-80	80 L/min (4800 L/h)	80 spm	10-80 °C	0.2-0.5 MPa
FW-20H	20 L/min (1200 L/h)	120 spm	10-180 °C	0.2-0.5 MPa up to 100 °C; 0.15-0.3 MPa at 101-150 °C; 0.15-0.2 MPa at 151-180 °C
FW-40H	40 L/min (2400 L/h)	80 spm	10-180 °C	0.2-0.5 MPa up to 100 °C; 0.15-0.3 MPa at 101-150 °C; 0.15-0.2 MPa at 151-180 °C

The maximum discharge capacity is given for clear water at 20 °C.

Operating conditions and applications

The FW series (up to 80 L/min) is designed for liquid temperatures of 10-100 °C (FW-80: 10-80 °C), and the high-temperature FW-H models (FW-20H and FW-40H, up to 40 L/min) for 10-180 °C. The ambient temperature is 0-40 °C. The catalog notes that the FW design is commonly used for chemical feed, in high-pressure and medium-temperature (10-100 °C) cleaning systems and for the circulation of CMP slurry liquids, while the FW-H, with its higher temperature capability, is used for chemical circulation in wafer cleaning applications.

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