Iwaki FS Series Pneumatic Bellows Pumps

Iwaki FS is a series of pneumatic (air-driven) bellows pumps developed for semiconductor manufacturing lines. All wetted parts are made of fluororesin (PTFE/PFA). On the FS-15/30/60H models the exterior is also coated with fluororesin, so no metallic component is exposed. The FS series belongs to the Iwaki F series of pneumatic bellows pumps, together with the FW/FW-H and FA series.

Sensor-driven bellows mechanism

The pump works with a proximity switch drive system: proximity sensors built into the pump open and close an external air solenoid valve, which makes the discharge easy to monitor and control with different pump controllers. On the FS-15/30/60H models, a higher stroke speed (240 spm maximum) allowed the size, weight and cost of the pump to be reduced; the actual stroke speed depends on the pump model and the application.

Model	Max. discharge capacity	Max. stroke speed	Liquid temperature	Max. air supply pressure
FS-15HT	15 L/min (900 L/h)	240 spm	5-180 °C	0.5 MPa
FS-30HT	30 L/min (1800 L/h)	220 spm	5-180 °C	0.5 MPa
FS-60HT	55 L/min (3300 L/h)	200 spm	5-180 °C	0.5 MPa
FS-100HT2	100 L/min (6000 L/h)	120 spm	10-180 °C	0.5 MPa

The maximum discharge capacity is given for clear water at 20 °C. The permitted air supply pressure decreases as the liquid temperature rises: for the FS-15/30/60HT it is 0.15-0.5 MPa up to 50 °C, 0.15-0.3 MPa at 51-100 °C and 0.15-0.2 MPa at 101-180 °C. For the FS-100HT2 the ranges are 0.15-0.5 MPa (10-100 °C), 0.15-0.4 MPa (101-140 °C) and 0.15-0.3 MPa (141-180 °C).

Operating conditions

According to the manufacturer, the FS-15/30/60H pumps are rated for liquid temperatures of 5-180 °C with a discharge pressure of up to 0.45 MPa. This range makes the pump usable in wet process circulation, CMP processes and chemical distribution feed systems. For exact flow and connection data per model, refer to the catalog and the instruction manual listed below.

Applications

In the application table of the F series catalog, the FS-H is marked as usable for wafer wet-bench cleaning (batch process and single wafer), chemical supply equipment, and the CMP process (mixed-liquid circulation and transfer, and cleaning). The FS pumps are therefore used in semiconductor wet-bench lines, CMP chemical supply and general chemical circulation and cleaning applications.

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